Development of numerically controlled local wet etching

FIGURING OF MILLIMETER-THICK ELLIPTICAL MIRROR SUBSTRATE USING NUMERICALLY CONTROLLED LOCAL WET ETCHING WITH LOW-PRESSURE POLISHING M.Nagano1, F.Yamaga1, N.Zettsu1, D.Yamazaki2, R.Maruyama2, K.Soyama2 and K.Yamamura1

1.Introduction Recently, various measurements using neutron beam have attracted much attention because of the ability to identify hydrogen atoms and water molecules exactly, sensitivity to magnetism and hard penetrating power. And high-intensity proton accelerator facilities are constructed for neutron research such as J-PARC in Japan, ISIS-TS2 in UK and SNS in USA. However, neutron intensity i...

Wet anisotropic etching of polyimide

With the aim of developing flexible biocompatible implants for in vivo studies of nerve regeneration [1], fabrication of passive polyimide membranes using the commercial available Kapton film (100HN and 50HN, from DuPont) was investigated. Polyimide has been widely used in microelectronics, and its application possibilities have been widening to other fields such as micromachining and biomedica...

Wet and Dry Etching Theory

Wet-Chemical Etching and Cleaning of Silicon

A Introduction Research and manufacturing related to silicon devices, circuits, and systems often relies on the wet-chemical etching of silicon wafers. The dissolution of silicon using liquid solutions is needed for deep etching and micromachining, shaping, and cleaning. Also, wet-chemistries are often used for defect delineation in single crystal silicon materials. In this paper, a review of t...

Wet Etching of Optical Thin Films